{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10474027","patent":{"patent_number":"US-10474027","title":"Method for forming an aligned mask","assignee":null,"inventors":[],"filing_date":"2017-11-13T00:00:00.000Z","publication_date":"2019-11-12T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":7,"abstract":"A method for forming an aligned mask comprises etching a reference mark on a substrate to demarcate a boundary of an etch region; forming an etch mask on the substrate, using an exposure setting, the etch mask having a boundary; and measuring a distance between the reference mark and the boundary. When the measured distance is outside a margin of a target distance, then the etch mask is removed from the substrate, the exposure setting is changed, a next etch mask is formed using the changed exposure setting, and said measuring is repeated. A set of reference marks can be etched on a top level in a set of levels to demarcate boundaries of etch regions. An etch-trim process can be performed to form steps in the set of levels, wherein the etch-trim process includes at least first and second etch-trim cycles using first and second reference marks."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method for forming an aligned mask","description":"A method for forming an aligned mask comprises etching a reference mark on a substrate to demarcate a boundary of an etch region; forming an etch mask on the substrate, using an exposure setting, the ","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10474027","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10474027","citation_suggestion":"Patentable. \"Method for forming an aligned mask\" (US-10474027). https://patentable.app/patents/US-10474027","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10474027","json":"https://patentable.app/api/llm-context/US-10474027","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T08:37:42.862Z"}