{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10474028","patent":{"patent_number":"US-10474028","title":"Template, method for fabricating template, and method for manufacturing semiconductor device","assignee":null,"inventors":[],"filing_date":"2018-03-01T00:00:00.000Z","publication_date":"2019-11-12T00:00:00.000Z","cpc_codes":["H01L"],"num_claims":13,"abstract":"A method for fabricating a template includes providing a substrate having a first protrusion portion, forming, on the first protrusion portion of the substrate, a first film including a plurality of first pattern portions and a second pattern portion surrounding the first pattern portions and having a thickness thicker than the first pattern portions, covering at least a portion of the first film with a second film, removing the second pattern portion and exposing one or more of the first pattern portions by removing a portion of the second film from an upper surface of the first pattern by a first etching process, and forming a second protrusion portion by etching the first protrusion portion using the second film as a mask. The method further includes removing the first pattern portions and processing the first protrusion portion and the second protrusion portion by a second etching process."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Template, method for fabricating template, and method for manufacturing semiconductor device","description":"A method for fabricating a template includes providing a substrate having a first protrusion portion, forming, on the first protrusion portion of the substrate, a first film including a plurality of f","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10474028","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10474028","citation_suggestion":"Patentable. \"Template, method for fabricating template, and method for manufacturing semiconductor device\" (US-10474028). https://patentable.app/patents/US-10474028","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10474028","json":"https://patentable.app/api/llm-context/US-10474028","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T20:11:15.340Z"}