{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10475230","patent":{"patent_number":"US-10475230","title":"Surface material pattern finish simulation device and surface material pattern finish simulation method","assignee":null,"inventors":[],"filing_date":"2017-12-19T00:00:00.000Z","publication_date":"2019-11-12T00:00:00.000Z","cpc_codes":["G06T","G06T","G06T","G06T"],"num_claims":14,"abstract":"A device for generating a simulation image including circuitry which obtains information including normal vector map and light source information about a source of light to be applied to a surface of a material, calculates incident light information about incident light to each of pixels in an image to be generated as simulation of a finish of a pattern including a picture and an uneven shape on the surface, calculates a radiance of reflected light from the surface with respect to each of the pixels in the image, based on calculation information including the incident light information, the normal vector map, diffuse reflectance information about the picture, gloss information indicating gloss of the surface, and observation condition information about the material, and controls display of the image based on the radiance of each of the pixels."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Surface material pattern finish simulation device and surface material pattern finish simulation method","description":"A device for generating a simulation image including circuitry which obtains information including normal vector map and light source information about a source of light to be applied to a surface of ","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10475230","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10475230","citation_suggestion":"Patentable. \"Surface material pattern finish simulation device and surface material pattern finish simulation method\" (US-10475230). https://patentable.app/patents/US-10475230","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10475230","json":"https://patentable.app/api/llm-context/US-10475230","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T21:44:46.959Z"}