{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10481491","patent":{"patent_number":"US-10481491","title":"Fluid droplet methodology and apparatus for imprint lithography","assignee":null,"inventors":[],"filing_date":"2016-12-12T00:00:00.000Z","publication_date":"2019-11-19T00:00:00.000Z","cpc_codes":["G06K","H01L"],"num_claims":11,"abstract":"A method can be used to generate a fluid droplet pattern for an imprint lithography process using a fluid dispense system having fluid dispense ports. The method can include determining a fluid droplet pattern for dispensing a formable material onto a substrate; during a first pass, dispensing the formable material onto the substrate to form a first part of the fluid droplet pattern for an imprint field; offsetting the fluid dispense ports and substrate relative to each other in an offset direction; and during a second pass, dispensing the formable material onto the substrate to form a second part of the fluid droplet pattern for the imprint field. The method can be used to form a patterned layer over a semiconductor wafer in fabricating an electronic device. An apparatus can be configured to carry out the method."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Fluid droplet methodology and apparatus for imprint lithography","description":"A method can be used to generate a fluid droplet pattern for an imprint lithography process using a fluid dispense system having fluid dispense ports. The method can include determining a fluid drople","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10481491","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10481491","citation_suggestion":"Patentable. \"Fluid droplet methodology and apparatus for imprint lithography\" (US-10481491). https://patentable.app/patents/US-10481491","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10481491","json":"https://patentable.app/api/llm-context/US-10481491","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T20:58:56.194Z"}