{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10483081","patent":{"patent_number":"US-10483081","title":"Self directed metrology and pattern classification","assignee":null,"inventors":[],"filing_date":"2016-08-25T00:00:00.000Z","publication_date":"2019-11-19T00:00:00.000Z","cpc_codes":["G06F","G06T","G06T","G01N","G01N","G06T","H01L","H01L"],"num_claims":37,"abstract":"Methods and systems for determining parameter(s) of a process to be performed on a specimen are provided. One system includes one or more computer subsystems configured for determining an area of a defect detected on a specimen. The computer subsystem(s) are also configured for correlating the area of the defect with information for a design for the specimen and determining a spatial relationship between the area of the defect and the information for the design based on results of the correlating. In addition, the computer subsystem(s) are configured for automatically generating a region of interest to be measured during a process performed for the specimen with a measurement subsystem based on the spatial relationship."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Self directed metrology and pattern classification","description":"Methods and systems for determining parameter(s) of a process to be performed on a specimen are provided. One system includes one or more computer subsystems configured for determining an area of a de","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10483081","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10483081","citation_suggestion":"Patentable. \"Self directed metrology and pattern classification\" (US-10483081). https://patentable.app/patents/US-10483081","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10483081","json":"https://patentable.app/api/llm-context/US-10483081","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T14:30:19.860Z"}