{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10488180","patent":{"patent_number":"US-10488180","title":"Mask inspection apparatus and mask inspection method","assignee":null,"inventors":[],"filing_date":"2016-03-08T00:00:00.000Z","publication_date":"2019-11-26T00:00:00.000Z","cpc_codes":["G01N","G06T","G06T","G06T","G01N","G01N","G01N","G06T","G06T","G06T"],"num_claims":13,"abstract":"An inspection target is illuminated by an illumination optical unit using a light source. Optical image data of a pattern disposed in the inspection target is acquired by an imaging unit by causing light transmitted or reflected to be incident to a first and second area of a sensor. Reference image data is generated, corresponding to the optical image data, from design data of the pattern. The optical image data is corrected by obtaining a fluctuation of a gradation value of optical image data acquired using light incident to the second area, and correcting a gradation value of optical image data acquired using the light incident to the first area. A line width of the pattern of the corrected data, and a line width error which is a difference between the line widths of corrected data and reference image data are obtained by the line width error obtaining unit."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Mask inspection apparatus and mask inspection method","description":"An inspection target is illuminated by an illumination optical unit using a light source. Optical image data of a pattern disposed in the inspection target is acquired by an imaging unit by causing li","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10488180","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10488180","citation_suggestion":"Patentable. \"Mask inspection apparatus and mask inspection method\" (US-10488180). https://patentable.app/patents/US-10488180","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10488180","json":"https://patentable.app/api/llm-context/US-10488180","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T20:06:34.379Z"}