{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10488699","patent":{"patent_number":"US-10488699","title":"Method for manufacturing black matrix and spacer","assignee":null,"inventors":[],"filing_date":"2018-03-19T00:00:00.000Z","publication_date":"2019-11-26T00:00:00.000Z","cpc_codes":["G02F","G02F","G02F"],"num_claims":14,"abstract":"Disclosed is a method for manufacturing black matrix and spacer, which includes steps of: providing a base substrate and coating the base substrate with a black photoresist layer; coating a transparent photoresist layer on black photoresist layer; providing a multi-tone mask plate including a first light-transmitting area and a second light-transmitting area, in which the transparent photoresist layer and the black photoresist layer both include a first section aligning with first light-transmitting area and a second section aligning with second light-transmitting area; using the multi-tone mask plate to expose transparent photoresist layer and black photoresist layer, in which the transparent photoresist layer in the first section forms a main spacer, and the black photoresist layer in the first section forms a first black matrix, the transparent photoresist layer in the second section forms an auxiliary spacer, and the black photoresist layer in the second section forms a second black matrix."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method for manufacturing black matrix and spacer","description":"Disclosed is a method for manufacturing black matrix and spacer, which includes steps of: providing a base substrate and coating the base substrate with a black photoresist layer; coating a transparen","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10488699","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10488699","citation_suggestion":"Patentable. \"Method for manufacturing black matrix and spacer\" (US-10488699). https://patentable.app/patents/US-10488699","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10488699","json":"https://patentable.app/api/llm-context/US-10488699","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T07:00:32.652Z"}