{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10488763","patent":{"patent_number":"US-10488763","title":"Pattern-edge placement predictor and monitor for lithographic exposure tool","assignee":null,"inventors":[],"filing_date":"2019-05-20T00:00:00.000Z","publication_date":"2019-11-26T00:00:00.000Z","cpc_codes":["G06T","G06T","G06T"],"num_claims":27,"abstract":"Method and system configured to reduce or even nullify the degradation of images created by the projector tool turns on the optimization of the pattern-imaging by adjusting parameters and hardware of the projector to judiciously impact the placement of various image edges at different locations in the image field. Adjustments to the projector (exposure tool) include a change of a setup parameter of the exposure tool and/or scanning synchronization and/or a change of a signature of the optical system of the exposure tool determined as a result of minimizing the pre-determined cost function(s) that are parts of a comprehensive edge-placement error model."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Pattern-edge placement predictor and monitor for lithographic exposure tool","description":"Method and system configured to reduce or even nullify the degradation of images created by the projector tool turns on the optimization of the pattern-imaging by adjusting parameters and hardware of ","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10488763","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10488763","citation_suggestion":"Patentable. \"Pattern-edge placement predictor and monitor for lithographic exposure tool\" (US-10488763). https://patentable.app/patents/US-10488763","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10488763","json":"https://patentable.app/api/llm-context/US-10488763","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T04:18:55.266Z"}