{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10490416","patent":{"patent_number":"US-10490416","title":"Structures and methods for improved lithographic processing","assignee":null,"inventors":[],"filing_date":"2015-11-16T00:00:00.000Z","publication_date":"2019-11-26T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":25,"abstract":"Described herein are structures and methods for preparing photobuckets for lithography, e.g. photolithography or electron-beam lithography. One method includes arranging photobuckets on a material to be etched using lithography and providing a layer of a first material at least on inner side walls of the photobuckets, followed by filling the photobuckets with a second material. The second material is more lithosensitive than the first material and the first material could be not lithosensitive at all. Layering each photobucket from the inner side wall(s) of the photobucket towards the center of the photobucket with materials that are increasingly more lithosensitive results in an improved control of lithographic patterning by reducing or eliminating edge placement errors of accidentally exposing photobuckets that should not have been exposed."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Structures and methods for improved lithographic processing","description":"Described herein are structures and methods for preparing photobuckets for lithography, e.g. photolithography or electron-beam lithography. One method includes arranging photobuckets on a material to ","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10490416","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10490416","citation_suggestion":"Patentable. \"Structures and methods for improved lithographic processing\" (US-10490416). https://patentable.app/patents/US-10490416","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10490416","json":"https://patentable.app/api/llm-context/US-10490416","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T09:25:15.241Z"}