{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10496785","patent":{"patent_number":"US-10496785","title":"Chemical mechanical polishing simulation methods and simulation devices thereof","assignee":null,"inventors":[],"filing_date":"2017-04-10T00:00:00.000Z","publication_date":"2019-12-03T00:00:00.000Z","cpc_codes":["G06F","G06F","G06F","G06F","G06F","H01L"],"num_claims":18,"abstract":"A CMP simulation method includes inputting a chip pattern layout including a plurality of graphic patterns, partitioning the chip pattern layout into targeting grids including a plurality of surrounding grids, and then calculating grid geometry characteristics of the targeting grids. The method also includes generating shifted grids by shifting the targeting grids, calculating weighted average grid geometry characteristics of the targeting grids and the shifted grids, and locating first hot spots on the chip pattern layout by performing a CMP simulation based on the grid geometry characteristics of the targeting grids. Further, the method includes generating optimized grid geometry characteristics by modifying the grid geometry characteristics of the targeting grids based on the weighted average grid geometry characteristics and the defined first hot spots, and then locating second hot spots on the chip pattern layout by performing the CMP simulation based on the optimized grid geometry characteristics."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Chemical mechanical polishing simulation methods and simulation devices thereof","description":"A CMP simulation method includes inputting a chip pattern layout including a plurality of graphic patterns, partitioning the chip pattern layout into targeting grids including a plurality of surroundi","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10496785","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10496785","citation_suggestion":"Patentable. \"Chemical mechanical polishing simulation methods and simulation devices thereof\" (US-10496785). https://patentable.app/patents/US-10496785","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10496785","json":"https://patentable.app/api/llm-context/US-10496785","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T21:47:35.673Z"}