{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10497543","patent":{"patent_number":"US-10497543","title":"Device for anisotropically etching a substrate, and method for operating a device for anisotropically etching a substrate","assignee":null,"inventors":[],"filing_date":"2015-07-06T00:00:00.000Z","publication_date":"2019-12-03T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L"],"num_claims":10,"abstract":"A device for etching a substrate includes a first reaction chamber into which a first gas is introduced; a second reaction chamber into which a second gas is introduced; and a coil device that generates an electromagnetic alternating field. At least one first reactive species is generated by applying the electromagnetic alternating field to the first gas and at least one second reactive species is generated by applying the electromagnetic alternating field to the second gas. The device further includes a separating device that prevents a direct gas exchange between the first and second reaction chambers; an etching chamber configured to receive the substrate to be anisotropically etched; and a mixing device configured such that the reactive species enter the mixing device, are mixed together, and in the mixed state act on the substrate so as to anisotropically etch the substrate in the etching chamber."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Device for anisotropically etching a substrate, and method for operating a device for anisotropically etching a substrate","description":"A device for etching a substrate includes a first reaction chamber into which a first gas is introduced; a second reaction chamber into which a second gas is introduced; and a coil device that generat","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10497543","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10497543","citation_suggestion":"Patentable. \"Device for anisotropically etching a substrate, and method for operating a device for anisotropically etching a substrate\" (US-10497543). https://patentable.app/patents/US-10497543","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10497543","json":"https://patentable.app/api/llm-context/US-10497543","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T18:24:31.179Z"}