{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10507466","patent":{"patent_number":"US-10507466","title":"Metal assisted chemical etching for fabricating high aspect ratio and straight silicon nanopillar arrays for sorting applications","assignee":null,"inventors":[],"filing_date":"2016-04-27T00:00:00.000Z","publication_date":"2019-12-17T00:00:00.000Z","cpc_codes":["B82Y","B82Y","G01N","H01L","H01L","H01L","B82Y","B82Y","G01N","G01N","G01N","H01L"],"num_claims":11,"abstract":"Techniques relate to forming a sorting device. A mesh is formed on top of a substrate. Metal assisted chemical etching is performed to remove substrate material of the substrate at locations of the mesh. Pillars are formed in the substrate by removal of the substrate material. The mesh is removed to leave the pillars in a nanopillar array. The pillars in the nanopillar array are designed with a spacing to sort particles of different sizes such that the particles at or above a predetermined dimension are sorted in a first direction and the particles below the predetermined dimension are sorted in a second direction."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Metal assisted chemical etching for fabricating high aspect ratio and straight silicon nanopillar arrays for sorting applications","description":"Techniques relate to forming a sorting device. A mesh is formed on top of a substrate. Metal assisted chemical etching is performed to remove substrate material of the substrate at locations of the me","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10507466","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10507466","citation_suggestion":"Patentable. \"Metal assisted chemical etching for fabricating high aspect ratio and straight silicon nanopillar arrays for sorting applications\" (US-10507466). https://patentable.app/patents/US-10507466","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10507466","json":"https://patentable.app/api/llm-context/US-10507466","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T04:01:07.983Z"}