{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10509328","patent":{"patent_number":"US-10509328","title":"Fabrication and use of dose maps and feature size maps during substrate processing","assignee":null,"inventors":[],"filing_date":"2018-04-27T00:00:00.000Z","publication_date":"2019-12-17T00:00:00.000Z","cpc_codes":["G06T","G05B","G06T","G06T"],"num_claims":20,"abstract":"Systems and methods discussed herein relate to patterning substrates during lithography and microlithography to form features to a set or sets of critical dimensions using dose. The dose maps are generated based upon images captured during manufacturing to account for process variation in a plurality of operations employed to pattern the substrates. The dose maps are used along with imaging programs to tune the voltages applied to various regions of a substrate in order to produce features to a set or sets of critical dimensions and compensate for upstream or downstream operations that may otherwise result in incorrect critical dimension formation."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Fabrication and use of dose maps and feature size maps during substrate processing","description":"Systems and methods discussed herein relate to patterning substrates during lithography and microlithography to form features to a set or sets of critical dimensions using dose. The dose maps are gene","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10509328","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10509328","citation_suggestion":"Patentable. \"Fabrication and use of dose maps and feature size maps during substrate processing\" (US-10509328). https://patentable.app/patents/US-10509328","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10509328","json":"https://patentable.app/api/llm-context/US-10509328","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T21:10:25.363Z"}