{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10509330","patent":{"patent_number":"US-10509330","title":"Method and device for characterizing a wafer patterned using at least one lithography step","assignee":null,"inventors":[],"filing_date":"2018-03-12T00:00:00.000Z","publication_date":"2019-12-17T00:00:00.000Z","cpc_codes":["G01N","G01N","G01N","G01N"],"num_claims":20,"abstract":"In an aspect, a plurality of parameters characteristic of the patterned wafer are determined based on measurements of the intensity of electromagnetic radiation after the diffraction thereof at the patterned wafer. The intensity measurements are carried out for at least one used structure and at least one auxiliary structure. The parameters are determined based on intensity values measured during the intensity measurements for respectively different combinations of wavelength, polarization and/or order of diffraction, and also on the basis of correspondingly calculated intensity values, with a mathematical optimization method being applied."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method and device for characterizing a wafer patterned using at least one lithography step","description":"In an aspect, a plurality of parameters characteristic of the patterned wafer are determined based on measurements of the intensity of electromagnetic radiation after the diffraction thereof at the pa","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10509330","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10509330","citation_suggestion":"Patentable. \"Method and device for characterizing a wafer patterned using at least one lithography step\" (US-10509330). https://patentable.app/patents/US-10509330","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10509330","json":"https://patentable.app/api/llm-context/US-10509330","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T02:40:00.007Z"}