{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10510538","patent":{"patent_number":"US-10510538","title":"Reducing EUV-induced material property changes","assignee":null,"inventors":[],"filing_date":"2017-04-27T00:00:00.000Z","publication_date":"2019-12-17T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":20,"abstract":"Representative systems and methods for preventing or otherwise reducing extreme-ultraviolet-induced material property changes (e.g., layer thickness shrinkage) include one or more thermal treatments to at least partially stabilize a material forming a material layer disposed over a substrate prior to extreme ultraviolet (EUV) exposure (e.g., wavelengths spanning about 124 nm to about 10 nm) attendant to photolithographic processing. Representative systems and methods provide for reduction of average compressive stress in a material layer after thermal treatment prior to extreme EUV photolithographic patterning. Representative thermal treatments may include one or more annealing processes, ultraviolet (UV) radiation treatments, ion implantations, ion bombardments, plasma treatments, surface baking treatments, surface coating treatments, surface ashing treatments, or pulsed laser treatments."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Reducing EUV-induced material property changes","description":"Representative systems and methods for preventing or otherwise reducing extreme-ultraviolet-induced material property changes (e.g., layer thickness shrinkage) include one or more thermal treatments t","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10510538","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10510538","citation_suggestion":"Patentable. \"Reducing EUV-induced material property changes\" (US-10510538). https://patentable.app/patents/US-10510538","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10510538","json":"https://patentable.app/api/llm-context/US-10510538","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T08:44:26.019Z"}