{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10514619","patent":{"patent_number":"US-10514619","title":"Sensor arrangement for a lithography system, lithography system, and method for operating a lithography system","assignee":null,"inventors":[],"filing_date":"2018-01-23T00:00:00.000Z","publication_date":"2019-12-24T00:00:00.000Z","cpc_codes":["G01D"],"num_claims":20,"abstract":"The disclosure provides a sensor arrangement for sensing a position of an optical element in a lithography system. The sensor arrangement includes: a first capacitive sensor device having a position-dependent variable first sensor capacitance that can be sensed using a first excitation signal; a second capacitive sensor device having a position-dependent variable second sensor capacitance that can be sensed using a second excitation signal; and a control device configured to produce the first and second excitation signals so that charges present on a parasitic capacitance associable with the first sensor device are at least partially compensated for by charges that are present on a parasitic capacitance associable with the second sensor device via a signal path outside the first and/or the second excitation signal path."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Sensor arrangement for a lithography system, lithography system, and method for operating a lithography system","description":"The disclosure provides a sensor arrangement for sensing a position of an optical element in a lithography system. The sensor arrangement includes: a first capacitive sensor device having a position-d","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10514619","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10514619","citation_suggestion":"Patentable. \"Sensor arrangement for a lithography system, lithography system, and method for operating a lithography system\" (US-10514619). https://patentable.app/patents/US-10514619","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10514619","json":"https://patentable.app/api/llm-context/US-10514619","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T04:21:56.944Z"}