{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10515172","patent":{"patent_number":"US-10515172","title":"RC tool accuracy time reduction","assignee":null,"inventors":[],"filing_date":"2018-10-15T00:00:00.000Z","publication_date":"2019-12-24T00:00:00.000Z","cpc_codes":["G06F","G06F","G06F","G06F","G06F","G06N","G06N","H01L","H01L","G06N","H01L"],"num_claims":20,"abstract":"Fabricating a first semiconductor device cell using a first process based on a first process parameter or material comprises extracting semiconductor device parameters from the first process parameters to obtain extracted semiconductor device parameters of a first semiconductor device cell. The fabrication process includes training an artificial intelligence to obtain a predictive artificial intelligence using training data as input, the training data comprising the extracted semiconductor device cell parameters and the first process parameter or material. A proposed process modification is provided to the predictive artificial intelligence to generate a predicted cell delay by the predictive artificial intelligence. The predicted cell delay is evaluated against a cell delay threshold. When the predicted cell delay satisfies the cell delay threshold, a new semiconductor device cell is fabricated using a modified process incorporating the proposed process modification."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"RC tool accuracy time reduction","description":"Fabricating a first semiconductor device cell using a first process based on a first process parameter or material comprises extracting semiconductor device parameters from the first process parameter","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10515172","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10515172","citation_suggestion":"Patentable. \"RC tool accuracy time reduction\" (US-10515172). https://patentable.app/patents/US-10515172","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10515172","json":"https://patentable.app/api/llm-context/US-10515172","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T06:23:10.378Z"}