{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10515797","patent":{"patent_number":"US-10515797","title":"Method for producing semiconductor device","assignee":null,"inventors":[],"filing_date":"2018-07-10T00:00:00.000Z","publication_date":"2019-12-24T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L"],"num_claims":15,"abstract":"According to one embodiment, a method for producing a semiconductor device includes forming a first film on a substrate. A second film is formed on the first film. A recess is formed in the second film. First processing by which a third film is formed on the second film to form a side face of the recess with the second film and second processing by which the first film exposed in the recess is processed by using the second and third films, are executed one or more times. In relation to an N-th (N is an integer greater than or equal to 1) first processing, before the third film is formed on the second film, a surface inclined with respect to the side face of the recess is formed above the side face of the recess."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method for producing semiconductor device","description":"According to one embodiment, a method for producing a semiconductor device includes forming a first film on a substrate. A second film is formed on the first film. A recess is formed in the second fil","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10515797","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10515797","citation_suggestion":"Patentable. \"Method for producing semiconductor device\" (US-10515797). https://patentable.app/patents/US-10515797","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10515797","json":"https://patentable.app/api/llm-context/US-10515797","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T04:20:40.326Z"}