{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10520416","patent":{"patent_number":"US-10520416","title":"Substrate treating method for a substrate treating apparatus that carries out etching treatment of substrates","assignee":null,"inventors":[],"filing_date":"2017-02-21T00:00:00.000Z","publication_date":"2019-12-31T00:00:00.000Z","cpc_codes":["G01N","G01N","H01L","H01L","H01L","H01L"],"num_claims":12,"abstract":"A substrate treating apparatus includes a circulating line having a treating tank for storing a phosphoric acid aqueous solution, a circulating pump for feeding the phosphoric acid aqueous solution, a heater for circulation for heating the phosphoric acid aqueous solution, a filter for filtering the phosphoric acid aqueous solution, the circulating line causing the phosphoric acid aqueous solution discharged from the treating tank to flow in order of the circulating pump, the heater for circulation and the filter, and returning the phosphoric acid aqueous solution from the filter to the treating tank. The apparatus also includes a branch pipe branching from the circulating line between the heater for circulation and the filter for extracting the phosphoric acid aqueous solution from the circulating line, and a concentration measuring station connected to the branch pipe for measuring silicon concentration in the phosphoric acid aqueous solution by potentiometry."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Substrate treating method for a substrate treating apparatus that carries out etching treatment of substrates","description":"A substrate treating apparatus includes a circulating line having a treating tank for storing a phosphoric acid aqueous solution, a circulating pump for feeding the phosphoric acid aqueous solution, a","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10520416","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10520416","citation_suggestion":"Patentable. \"Substrate treating method for a substrate treating apparatus that carries out etching treatment of substrates\" (US-10520416). https://patentable.app/patents/US-10520416","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10520416","json":"https://patentable.app/api/llm-context/US-10520416","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T10:39:45.153Z"}