{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10522380","patent":{"patent_number":"US-10522380","title":"Method and apparatus for determining substrate placement in a process chamber","assignee":null,"inventors":[],"filing_date":"2014-06-20T00:00:00.000Z","publication_date":"2019-12-31T00:00:00.000Z","cpc_codes":["H01L","H01L"],"num_claims":18,"abstract":"Methods for determining substrate placement in a process chamber are provided herein. In some embodiments, a method for determining substrate placement in a process chamber includes receiving sensor readings from a plurality of sensor arrays attached to the calibration substrate, calculating locations of a plurality of edge locations of a support member beneath the sensors based on the sensor readings, calculating a center point location of the support member based on the locations of the plurality of edge locations of the support member and determining an offset between the center point location and a location of the center of the calibration substrate."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method and apparatus for determining substrate placement in a process chamber","description":"Methods for determining substrate placement in a process chamber are provided herein. In some embodiments, a method for determining substrate placement in a process chamber includes receiving sensor r","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10522380","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10522380","citation_suggestion":"Patentable. \"Method and apparatus for determining substrate placement in a process chamber\" (US-10522380). https://patentable.app/patents/US-10522380","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10522380","json":"https://patentable.app/api/llm-context/US-10522380","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T19:16:01.915Z"}