{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10522548","patent":{"patent_number":"US-10522548","title":"Semiconductor device and method for fabricating the same","assignee":null,"inventors":[],"filing_date":"2018-01-10T00:00:00.000Z","publication_date":"2019-12-31T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L"],"num_claims":20,"abstract":"A method for fabricating a semiconductor device includes: forming a first conductive layer; forming a second conductive layer over the first conductive layer; forming a conductive line by etching the second conductive layer; etching a portion of the first conductive layer to form a plug head having the same critical dimension as the conductive line; forming a first spacer that covers the conductive line and the plug head; etching the remaining first conductive layer to form a plug body that is aligned with the first spacer, wherein the plug body have a greater critical dimension than the plug head; and forming a second spacer by performing a selective oxidation onto a side wall of the plug body."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Semiconductor device and method for fabricating the same","description":"A method for fabricating a semiconductor device includes: forming a first conductive layer; forming a second conductive layer over the first conductive layer; forming a conductive line by etching the ","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10522548","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10522548","citation_suggestion":"Patentable. \"Semiconductor device and method for fabricating the same\" (US-10522548). https://patentable.app/patents/US-10522548","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10522548","json":"https://patentable.app/api/llm-context/US-10522548","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T10:01:28.341Z"}