{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10522644","patent":{"patent_number":"US-10522644","title":"Different upper and lower spacers for contact","assignee":null,"inventors":[],"filing_date":"2018-06-21T00:00:00.000Z","publication_date":"2019-12-31T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L"],"num_claims":19,"abstract":"Various processes form different structures including exemplary apparatuses that include (among other components) a first layer having channel regions, source/drain structures in the first layer on opposite sides of the channel regions, a gate insulator on the channel region, and a gate stack on the gate insulator. The gate stack can include a gate conductor, and a stack insulator or a gate contact on the gate conductor. The gate stack has lower sidewalls adjacent to the source/drain structures and upper sidewalls distal to the source/drain structures. Further, lower spacers are between the source/drain contacts and the lower sidewalls of the gate stack; and upper spacers between the source/drain contacts and the upper sidewalls of the gate stack. In some structures, the upper spacers can partially overlap the lower spacers."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Different upper and lower spacers for contact","description":"Various processes form different structures including exemplary apparatuses that include (among other components) a first layer having channel regions, source/drain structures in the first layer on op","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10522644","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10522644","citation_suggestion":"Patentable. \"Different upper and lower spacers for contact\" (US-10522644). https://patentable.app/patents/US-10522644","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10522644","json":"https://patentable.app/api/llm-context/US-10522644","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T07:43:38.435Z"}