{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10529534","patent":{"patent_number":"US-10529534","title":"Compensating for scanning electron microscope beam distortion-induced metrology error using design","assignee":null,"inventors":[],"filing_date":"2018-04-27T00:00:00.000Z","publication_date":"2020-01-07T00:00:00.000Z","cpc_codes":["G06N","G06N","G06N","G06T","G06T","G06T","G06T","G06N","G06T","G06T","G06T","G06T","G06T","G06T"],"num_claims":20,"abstract":"Methods and systems for quantifying and correcting for non-uniformities in images used for metrology operations are disclosed. A metrology area image of a wafer and a design clip may be used. The metrology area image may be a scanning electron microscope image. The design clip may be the design clip of the wafer or a synthesized design clip. Tool distortions, including electron beam distortions, can be quantified and corrected. The design clip can be applied to the metrology area image to obtain a synthesized image such that one or more process change variations are suppressed and one or more tool distortions are enhanced."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Compensating for scanning electron microscope beam distortion-induced metrology error using design","description":"Methods and systems for quantifying and correcting for non-uniformities in images used for metrology operations are disclosed. A metrology area image of a wafer and a design clip may be used. The metr","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10529534","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10529534","citation_suggestion":"Patentable. \"Compensating for scanning electron microscope beam distortion-induced metrology error using design\" (US-10529534). https://patentable.app/patents/US-10529534","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10529534","json":"https://patentable.app/api/llm-context/US-10529534","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T18:23:31.136Z"}