{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10529571","patent":{"patent_number":"US-10529571","title":"Method of fabricating patterned structure","assignee":null,"inventors":[],"filing_date":"2019-01-31T00:00:00.000Z","publication_date":"2020-01-07T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L"],"num_claims":19,"abstract":"A method of fabricating a patterned structure includes the following steps. A pattern transfer layer is formed on a material layer. The pattern transfer layer is formed above a first region and a second region. First patterns are formed on the pattern transfer layer. A mask layer is formed. A first part of the mask layer covers the first patterns above the first region. A first cap layer is formed covering the first part of the mask layer and the first patterns above the second region. The first cap layer covering the first part of the mask layer is removed for exposing the first part of the mask layer. The first part of the mask layer is removed. A first etching process is performed to the pattern transfer layer with the first patterns above the first region as a mask after removing the first part of the mask layer."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method of fabricating patterned structure","description":"A method of fabricating a patterned structure includes the following steps. A pattern transfer layer is formed on a material layer. The pattern transfer layer is formed above a first region and a seco","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10529571","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10529571","citation_suggestion":"Patentable. \"Method of fabricating patterned structure\" (US-10529571). https://patentable.app/patents/US-10529571","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10529571","json":"https://patentable.app/api/llm-context/US-10529571","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T10:32:53.216Z"}