{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10529586","patent":{"patent_number":"US-10529586","title":"Method of manufacturing semiconductor device","assignee":null,"inventors":[],"filing_date":"2018-05-25T00:00:00.000Z","publication_date":"2020-01-07T00:00:00.000Z","cpc_codes":["H01L","H01L"],"num_claims":9,"abstract":"A method of manufacturing semiconductor device is provided in the present disclosure. The method includes forming a first pattern layer on a first area of a substrate, forming a spin on layer on the first pattern layer and the substrate, forming an etch stop layer on the spin on layer, and forming a first mask layer on the etch stop layer."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method of manufacturing semiconductor device","description":"A method of manufacturing semiconductor device is provided in the present disclosure. The method includes forming a first pattern layer on a first area of a substrate, forming a spin on layer on the f","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10529586","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10529586","citation_suggestion":"Patentable. \"Method of manufacturing semiconductor device\" (US-10529586). https://patentable.app/patents/US-10529586","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10529586","json":"https://patentable.app/api/llm-context/US-10529586","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T03:36:53.289Z"}