{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10529589","patent":{"patent_number":"US-10529589","title":"Method of plasma etching of silicon-containing organic film using sulfur-based chemistry","assignee":null,"inventors":[],"filing_date":"2018-06-01T00:00:00.000Z","publication_date":"2020-01-07T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":21,"abstract":"A method of etching is described. The method providing a substrate having a first material composed of silicon-containing organic material and a second material that is different from the first material, forming a chemical mixture by plasma-excitation of a process gas containing SF6 and an optional inert gas, controlling a processing pressure at or above 100 mtorr, and exposing the first material on the substrate to the chemical mixture to selectively etch the first material relative to the second material."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method of plasma etching of silicon-containing organic film using sulfur-based chemistry","description":"A method of etching is described. The method providing a substrate having a first material composed of silicon-containing organic material and a second material that is different from the first materi","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10529589","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10529589","citation_suggestion":"Patentable. \"Method of plasma etching of silicon-containing organic film using sulfur-based chemistry\" (US-10529589). https://patentable.app/patents/US-10529589","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10529589","json":"https://patentable.app/api/llm-context/US-10529589","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T11:18:42.451Z"}