{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10534262","patent":{"patent_number":"US-10534262","title":"Chemically amplified positive resist composition and patterning process","assignee":null,"inventors":[],"filing_date":"2016-10-26T00:00:00.000Z","publication_date":"2020-01-14T00:00:00.000Z","cpc_codes":["G06F"],"num_claims":8,"abstract":"A chemically amplified positive resist composition is provided comprising a specific alkali-soluble polymer adapted to turn soluble in alkaline aqueous solution under the action of acid as base resin, an alkali-soluble polymer, and a photoacid generator in an organic solvent. The composition forms a resist film which can be briefly developed to form a pattern at a high sensitivity without generating dimples in pattern sidewalls."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Chemically amplified positive resist composition and patterning process","description":"A chemically amplified positive resist composition is provided comprising a specific alkali-soluble polymer adapted to turn soluble in alkaline aqueous solution under the action of acid as base resin,","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10534262","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10534262","citation_suggestion":"Patentable. \"Chemically amplified positive resist composition and patterning process\" (US-10534262). https://patentable.app/patents/US-10534262","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10534262","json":"https://patentable.app/api/llm-context/US-10534262","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T01:51:18.296Z"}