{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10535520","patent":{"patent_number":"US-10535520","title":"Fin patterning methods for increased process margins","assignee":null,"inventors":[],"filing_date":"2017-08-23T00:00:00.000Z","publication_date":"2020-01-14T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L"],"num_claims":20,"abstract":"The present disclosure provides a method in accordance with some embodiments. The method includes forming a material layer that includes an array of fin features, wherein at least one fin feature has a first material on a first sidewall and a second material on a second sidewall that is opposite to the first sidewall, wherein the first material is different from the second material. The method further includes exposing the second sidewall of the at least one fin feature and removing the at least one fin feature."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Fin patterning methods for increased process margins","description":"The present disclosure provides a method in accordance with some embodiments. The method includes forming a material layer that includes an array of fin features, wherein at least one fin feature has ","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10535520","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10535520","citation_suggestion":"Patentable. \"Fin patterning methods for increased process margins\" (US-10535520). https://patentable.app/patents/US-10535520","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10535520","json":"https://patentable.app/api/llm-context/US-10535520","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T09:21:09.331Z"}