{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10539884","patent":{"patent_number":"US-10539884","title":"Post-lithography defect inspection using an e-beam inspection tool","assignee":null,"inventors":[],"filing_date":"2018-02-22T00:00:00.000Z","publication_date":"2020-01-21T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":20,"abstract":"Methods for post-lithographic inspection using an e-beam inspection tool of organic EUV sensitive photoresists generally includes conformal deposition of a silicon derivative or a metal oxide onto the relief image, wherein the silicon derivative is a material selected to have a dielectric constant that is greater than the dielectric constant of the underlying organic EUV sensitive photoresist. The conformal deposition of the silicon derivative or the metal oxide includes a low temperature vapor deposition process of less than about 100° C. to provide a coating thickness of less than about 5 nanometers."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Post-lithography defect inspection using an e-beam inspection tool","description":"Methods for post-lithographic inspection using an e-beam inspection tool of organic EUV sensitive photoresists generally includes conformal deposition of a silicon derivative or a metal oxide onto the","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10539884","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10539884","citation_suggestion":"Patentable. \"Post-lithography defect inspection using an e-beam inspection tool\" (US-10539884). https://patentable.app/patents/US-10539884","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10539884","json":"https://patentable.app/api/llm-context/US-10539884","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T07:34:22.115Z"}