{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10546719","patent":{"patent_number":"US-10546719","title":"Face-on, gas-assisted etching for plan-view lamellae preparation","assignee":null,"inventors":[],"filing_date":"2018-05-23T00:00:00.000Z","publication_date":"2020-01-28T00:00:00.000Z","cpc_codes":["G01N","G01N","G01N","H01L","H01L","G01N","H01L","H01L"],"num_claims":19,"abstract":"Method for preparing site-specific, plan-view lamellae from multilayered microelectronic devices. A focused ion beam that is directed, with an etch-assisting gas, toward an uppermost layer of a device removes at least that uppermost layer and thereby exposes an underlying layer over, or comprising, a target area from which the site-specific, plan-view lamella is to be prepared, wherein the focused ion beam is in a face-on orientation in removing the uppermost layer to expose the underlying layer. In a preferred embodiment, the etch-assisting gas comprises methyl nitroacetate. In alternative embodiments, the etch-assisting gas is methyl acetate, ethyl acetate, ethyl nitroacetate, propyl acetate, propyl nitroacetate, nitro ethyl acetate, methyl methoxyacetate, or methoxy acetylchloride."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Face-on, gas-assisted etching for plan-view lamellae preparation","description":"Method for preparing site-specific, plan-view lamellae from multilayered microelectronic devices. A focused ion beam that is directed, with an etch-assisting gas, toward an uppermost layer of a device","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10546719","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10546719","citation_suggestion":"Patentable. \"Face-on, gas-assisted etching for plan-view lamellae preparation\" (US-10546719). https://patentable.app/patents/US-10546719","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10546719","json":"https://patentable.app/api/llm-context/US-10546719","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T13:25:55.200Z"}