{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-10546863","patent":{"patent_number":"US-10546863","title":"Method for fabricating bit line contact","assignee":null,"inventors":[],"filing_date":"2018-08-02T00:00:00.000Z","publication_date":"2020-01-28T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":28,"abstract":"Disclosed herein is a method that includes: forming a composite layer, the composite layer comprising first and second insulative materials and a first polysilicon layer that is between the first and second insulative materials, forming a hole in the composite layer, the hole penetrating through the composite layer to define respective edge portions of the first and second insulative materials and the first polysilicon layer, and converting the edge portion of the first polysilicon layer into third insulative material so that the third insulative material is between the respective edges of the first and second insulative materials."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method for fabricating bit line contact","description":"Disclosed herein is a method that includes: forming a composite layer, the composite layer comprising first and second insulative materials and a first polysilicon layer that is between the first and ","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-10546863","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-10546863","citation_suggestion":"Patentable. \"Method for fabricating bit line contact\" (US-10546863). https://patentable.app/patents/US-10546863","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-10546863","json":"https://patentable.app/api/llm-context/US-10546863","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T10:40:17.187Z"}