{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11244868","patent":{"patent_number":"US-11244868","title":"Method for manufacturing microelectronic components","assignee":null,"inventors":[],"filing_date":"2020-08-21T00:00:00.000Z","publication_date":"2022-02-08T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":17,"abstract":"A method for producing a component is provided, a base of which is formed by transistors on a substrate, including: forming a gate area, spacers, and a protective coating partly covering the spacers and a sidewall portion of a cavity without covering a top face of the gate area and a base portion of the cavity; forming a contact module, the gate located in beneath the module; and removing part of the coating with an isotropic light-ion implantation to form modified superficial parts in a thickness, respectively, of the contact module, of the coating, and of the base portion, and with an application of a plasma to: etch the modified superficial parts to only preserve, in the coating, a residual part of the coating, and to form a silicon oxide-based film on exposed surfaces, respectively, of the contact module, of the cavity, and of the coating."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method for manufacturing microelectronic components","description":"A method for producing a component is provided, a base of which is formed by transistors on a substrate, including: forming a gate area, spacers, and a protective coating partly covering the spacers a","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11244868","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11244868","citation_suggestion":"Patentable. \"Method for manufacturing microelectronic components\" (US-11244868). https://patentable.app/patents/US-11244868","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11244868","json":"https://patentable.app/api/llm-context/US-11244868","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T17:16:03.236Z"}