{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11245005","patent":{"patent_number":"US-11245005","title":"Method for manufacturing semiconductor structure with extended contact structure","assignee":null,"inventors":[],"filing_date":"2020-05-07T00:00:00.000Z","publication_date":"2022-02-08T00:00:00.000Z","cpc_codes":["B82Y","H01L"],"num_claims":20,"abstract":"Methods for forming semiconductor structures are provided. The method includes alternately stacking first semiconductor layers and second semiconductor layers over a substrate and patterning the first semiconductor layers and the second semiconductor layers to form a first fin structure. The method further includes forming a first trench in the first fin structure and forming a first source/drain structure in the first trench. The method further includes partially removing the first source/drain structure to form a second trench in the first source/drain structure and forming a first contact in the second trench."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method for manufacturing semiconductor structure with extended contact structure","description":"Methods for forming semiconductor structures are provided. The method includes alternately stacking first semiconductor layers and second semiconductor layers over a substrate and patterning the first","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11245005","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11245005","citation_suggestion":"Patentable. \"Method for manufacturing semiconductor structure with extended contact structure\" (US-11245005). https://patentable.app/patents/US-11245005","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11245005","json":"https://patentable.app/api/llm-context/US-11245005","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T09:15:15.322Z"}