{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11257678","patent":{"patent_number":"US-11257678","title":"Plasma processing method","assignee":null,"inventors":[],"filing_date":"2019-04-19T00:00:00.000Z","publication_date":"2022-02-22T00:00:00.000Z","cpc_codes":["H01L","H01L"],"num_claims":8,"abstract":"The invention has been made in view of the above problems, and provides a plasma processing method capable of preventing etching shape abnormality in a plasma processing method for forming a mask layer of a polysilicon film. The invention relates to a plasma processing method for plasma-etching a polysilicon film, the plasma processing method comprising plasma-etching the polysilicon film using a mixed gas including a halogen gas, a fluorocarbon gas, an oxygen gas, and a carbonyl sulfide gas."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Plasma processing method","description":"The invention has been made in view of the above problems, and provides a plasma processing method capable of preventing etching shape abnormality in a plasma processing method for forming a mask laye","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11257678","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11257678","citation_suggestion":"Patentable. \"Plasma processing method\" (US-11257678). https://patentable.app/patents/US-11257678","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11257678","json":"https://patentable.app/api/llm-context/US-11257678","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T22:36:42.450Z"}