{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11264218","patent":{"patent_number":"US-11264218","title":"Substrate processing apparatus and cleaning method","assignee":null,"inventors":[],"filing_date":"2020-01-31T00:00:00.000Z","publication_date":"2022-03-01T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L"],"num_claims":14,"abstract":"An apparatus of processing a target substrate is provided. The apparatus includes a processing chamber having a substantially cylindrical inner space, a mounting table disposed in the processing chamber and configured to mount thereon the target substrate, at least one supply line configured to supply a gas in a direction along an inner wall surface of a sidewall of the processing chamber to generate a swirl flow of the gas in the processing chamber, and a ventilator configured to exhaust the gas from the processing chamber. Further, in a direction intersecting an axis of the substantially cylindrical inner space, a flow velocity of the gas in a first region close to the inner wall surface is higher than a flow velocity of the gas in a second region where the mounting table is disposed."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Substrate processing apparatus and cleaning method","description":"An apparatus of processing a target substrate is provided. The apparatus includes a processing chamber having a substantially cylindrical inner space, a mounting table disposed in the processing chamb","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11264218","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11264218","citation_suggestion":"Patentable. \"Substrate processing apparatus and cleaning method\" (US-11264218). https://patentable.app/patents/US-11264218","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11264218","json":"https://patentable.app/api/llm-context/US-11264218","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T08:26:18.585Z"}