{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11264288","patent":{"patent_number":"US-11264288","title":"Gate structure and patterning method","assignee":null,"inventors":[],"filing_date":"2019-04-11T00:00:00.000Z","publication_date":"2022-03-01T00:00:00.000Z","cpc_codes":["H01L"],"num_claims":20,"abstract":"A method of integrated circuit (IC) fabrication includes exposing a plurality of channel regions including a p-type channel region and an n-type channel region; forming a gate dielectric layer over the exposed channel regions; and forming a work function metal (WFM) structure over the gate dielectric layer. The WFM structure includes a p-type WFM portion formed over the p-type channel region and an n-type WFM portion formed over the n-type channel region, and the p-type WFM portion is thinner than the n-type WFM portion. The method further includes forming a fill metal layer over the WFM structure such that the fill metal layer is in direct contact with both the p-type and n-type WFM portions."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Gate structure and patterning method","description":"A method of integrated circuit (IC) fabrication includes exposing a plurality of channel regions including a p-type channel region and an n-type channel region; forming a gate dielectric layer over th","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11264288","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11264288","citation_suggestion":"Patentable. \"Gate structure and patterning method\" (US-11264288). https://patentable.app/patents/US-11264288","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11264288","json":"https://patentable.app/api/llm-context/US-11264288","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T23:10:37.334Z"}