{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11279905","patent":{"patent_number":"US-11279905","title":"Semiconductor substrate cleaning agent","assignee":null,"inventors":[],"filing_date":"2017-12-28T00:00:00.000Z","publication_date":"2022-03-22T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L"],"num_claims":17,"abstract":"To provide a cleaning agent that can remove impurities such as metal polishing dust adhering to a semiconductor substrate without corroding metal and can prevent re-adhesion of the impurities.The semiconductor substrate cleaning agent of the present invention contains at least the following component (A) and component (B):Component (A): a water-soluble oligomer having a weight average molecular weight of not less than 100 and less than 10000; andComponent (B): water.It is preferable that the water-soluble oligomer is at least one compound selected from compounds represented by the following formulas (a-1) to (a-3). Ra1O—(C3H6O2)n—H  (a-1)Ra2O—(Ra3O)n′—H  (a-2)(Ra4)3-s—N—[(Ra5O)n″—H]s  (a-3)"},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Semiconductor substrate cleaning agent","description":"To provide a cleaning agent that can remove impurities such as metal polishing dust adhering to a semiconductor substrate without corroding metal and can prevent re-adhesion of the impurities.The semi","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11279905","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11279905","citation_suggestion":"Patentable. \"Semiconductor substrate cleaning agent\" (US-11279905). https://patentable.app/patents/US-11279905","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11279905","json":"https://patentable.app/api/llm-context/US-11279905","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T19:14:19.853Z"}