{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11282696","patent":{"patent_number":"US-11282696","title":"Method and device for wet processing integrated circuit substrates using a mixture of chemical steam vapors and chemical gases","assignee":null,"inventors":[],"filing_date":"2019-11-22T00:00:00.000Z","publication_date":"2022-03-22T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":5,"abstract":"A method and device for wet processing and integrated circuit (IC) substrates using a fresh mixture of chemical steam vapors and chemical gases may include loading the substrates into an enclosed process chamber with a 90° rotatable middle section; closing the process chamber; conditioning the process chamber with preset temperature nitrogen gas; injecting a fresh mixture of chemical gas and chemical steam into the processing chamber sequentially to condense wet process fresh chemicals on site; circulating the mixture of chemical steam vapors or liquid chemicals and rotating at least one magnetic rod within the processing chamber to treat the substrates uniformly; performing a deionized water rinse of the substrates and turning on the adjustable multi-modulated megasonic energy when necessary; injecting solvent isopropyl alcohol steam vapor into the processing chamber for the Marangoni drying; completely drying the substrates and the processing chamber with hot nitrogen gas; and unloading the treated substrates."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method and device for wet processing integrated circuit substrates using a mixture of chemical steam vapors and chemical gases","description":"A method and device for wet processing and integrated circuit (IC) substrates using a fresh mixture of chemical steam vapors and chemical gases may include loading the substrates into an enclosed proc","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11282696","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11282696","citation_suggestion":"Patentable. \"Method and device for wet processing integrated circuit substrates using a mixture of chemical steam vapors and chemical gases\" (US-11282696). https://patentable.app/patents/US-11282696","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11282696","json":"https://patentable.app/api/llm-context/US-11282696","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T17:42:21.370Z"}