{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11282708","patent":{"patent_number":"US-11282708","title":"Light irradiation type heat treatment method and heat treatment apparatus","assignee":null,"inventors":[],"filing_date":"2020-04-02T00:00:00.000Z","publication_date":"2022-03-22T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":4,"abstract":"Performed is a hydrogen anneal of heating a semiconductor wafer on which a thin film containing a dopant and carbon is formed to an anneal temperature in an atmosphere containing hydrogen. Subsequently, a hydrogen atmosphere in a chamber is replaced with an oxygen atmosphere, and the semiconductor wafer is preheated to a preheating temperature in the oxygen atmosphere. Performed then is a flash heating treatment of heating a surface of the semiconductor wafer to a peak temperature for less than one second. The semiconductor wafer is heated in the oxygen atmosphere, thus activation of dopant and binding of carbon in the thin film and oxygen in the atmosphere are promoted, and carbon is exhausted from the thin film to prevent hardening of the thin film. As a result, the thin film containing carbon can be easily peeled from the semiconductor wafer."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Light irradiation type heat treatment method and heat treatment apparatus","description":"Performed is a hydrogen anneal of heating a semiconductor wafer on which a thin film containing a dopant and carbon is formed to an anneal temperature in an atmosphere containing hydrogen. Subsequentl","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11282708","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11282708","citation_suggestion":"Patentable. \"Light irradiation type heat treatment method and heat treatment apparatus\" (US-11282708). https://patentable.app/patents/US-11282708","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11282708","json":"https://patentable.app/api/llm-context/US-11282708","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T20:35:09.630Z"}