{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11289376","patent":{"patent_number":"US-11289376","title":"Methods for forming self-aligned interconnect structures","assignee":null,"inventors":[],"filing_date":"2020-06-04T00:00:00.000Z","publication_date":"2022-03-29T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":20,"abstract":"The present disclosure provides a method for forming interconnect structures. The method includes providing a semiconductor structure including a substrate and a conductive feature formed in a top portion of the substrate; depositing a resist layer over the substrate, wherein the resist layer has an exposure threshold; providing a radiation with an incident exposure dose to the resist layer, wherein the incident exposure dose is configured to be less than the exposure threshold of the resist layer while a sum of the incident exposure dose and a reflected exposure dose from a top surface of the conductive feature is larger than the exposure threshold of the resist layer, thereby forming a latent pattern above the conductive feature; and developing the resist layer to form a patterned resist layer."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Methods for forming self-aligned interconnect structures","description":"The present disclosure provides a method for forming interconnect structures. The method includes providing a semiconductor structure including a substrate and a conductive feature formed in a top por","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11289376","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11289376","citation_suggestion":"Patentable. \"Methods for forming self-aligned interconnect structures\" (US-11289376). https://patentable.app/patents/US-11289376","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11289376","json":"https://patentable.app/api/llm-context/US-11289376","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T13:42:21.355Z"}