{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11289493","patent":{"patent_number":"US-11289493","title":"Patterning method","assignee":null,"inventors":[],"filing_date":"2019-10-31T00:00:00.000Z","publication_date":"2022-03-29T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":14,"abstract":"A patterning method includes sequentially forming a target layer, a first layer, a second layer, a third layer, and a first mask pattern. A first spacer is formed on a sidewall of the first mask layer. The first mask pattern is removed to form a plurality of peripheral openings surrounding a central opening in the first spacer. A rounding process is performed to round the peripheral openings and form a second mask pattern. A portion of the second layer is removed by using the second mask pattern as a mask, so as to form a third mask pattern. A second spacer is formed in the third mask pattern. The third mask pattern is removed. Portions of the first layer and the target layer are removed by using the second spacer as a mask."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Patterning method","description":"A patterning method includes sequentially forming a target layer, a first layer, a second layer, a third layer, and a first mask pattern. A first spacer is formed on a sidewall of the first mask layer","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11289493","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11289493","citation_suggestion":"Patentable. \"Patterning method\" (US-11289493). https://patentable.app/patents/US-11289493","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11289493","json":"https://patentable.app/api/llm-context/US-11289493","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T11:20:44.400Z"}