{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11292938","patent":{"patent_number":"US-11292938","title":"Method of selective chemical mechanical polishing cobalt, zirconium oxide, poly-silicon and silicon dioxide films","assignee":null,"inventors":[],"filing_date":"2019-09-11T00:00:00.000Z","publication_date":"2022-04-05T00:00:00.000Z","cpc_codes":["H01L","H01L"],"num_claims":11,"abstract":"A process for chemical mechanical polishing a substrate containing cobalt, zirconium oxide, poly-silicon and silicon dioxide, wherein the cobalt, zirconium, and poly-silicon removal rates are selective over silicon dioxide. The chemical mechanical polishing composition includes water, a benzyltrialkyl quaternary ammonium compound, cobalt chelating agent, corrosion inhibitor, colloidal silica abrasive, optionally a biocide and optionally a pH adjusting agent, and a pH greater than 7, and the chemical mechanical polishing compositions are free of oxidizing agents."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method of selective chemical mechanical polishing cobalt, zirconium oxide, poly-silicon and silicon dioxide films","description":"A process for chemical mechanical polishing a substrate containing cobalt, zirconium oxide, poly-silicon and silicon dioxide, wherein the cobalt, zirconium, and poly-silicon removal rates are selectiv","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11292938","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11292938","citation_suggestion":"Patentable. \"Method of selective chemical mechanical polishing cobalt, zirconium oxide, poly-silicon and silicon dioxide films\" (US-11292938). https://patentable.app/patents/US-11292938","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11292938","json":"https://patentable.app/api/llm-context/US-11292938","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T20:42:05.339Z"}