{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11295432","patent":{"patent_number":"US-11295432","title":"Broad band plasma inspection based on a nuisance map","assignee":null,"inventors":[],"filing_date":"2018-05-02T00:00:00.000Z","publication_date":"2022-04-05T00:00:00.000Z","cpc_codes":["G06T","G06T","G06T"],"num_claims":19,"abstract":"A noise map is used for defect detection. One or more measurements of intensities at one or more pixels are received and an intensity statistic is determined for each measurement. The intensity statistics are grouped into at least one region and stored with at least one alignment target. A wafer can be inspected with a wafer inspection tool using the noise map. The noise map can be used as a segmentation mask to suppress noise."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Broad band plasma inspection based on a nuisance map","description":"A noise map is used for defect detection. One or more measurements of intensities at one or more pixels are received and an intensity statistic is determined for each measurement. The intensity statis","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11295432","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11295432","citation_suggestion":"Patentable. \"Broad band plasma inspection based on a nuisance map\" (US-11295432). https://patentable.app/patents/US-11295432","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11295432","json":"https://patentable.app/api/llm-context/US-11295432","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T18:50:16.811Z"}