{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11300948","patent":{"patent_number":"US-11300948","title":"Process control of semiconductor fabrication based on spectra quality metrics","assignee":null,"inventors":[],"filing_date":"2019-06-27T00:00:00.000Z","publication_date":"2022-04-12T00:00:00.000Z","cpc_codes":["G05B","G05B","G05B","G05B","G05B"],"num_claims":20,"abstract":"A process control method for manufacturing semiconductor devices, including determining a quality metric of a production semiconductor wafer by comparing production scatterometric spectra of a production structure of the production wafer with reference scatterometric spectra of a reference structure of reference semiconductor wafers, the production structure corresponding to the reference structure, the reference spectra linked by machine learning to a reference measurement value of the reference structure, determining a process control parameter value (PCPV) of a wafer processing step, the PCPV determined based on measurement of the production wafer and whose contribution to the PCPV is weighted with a first predefined weight based on the quality metric, and based on a measurement of a different wafer and whose contribution to the PCPV is weighted with a second predefined weight based on the quality metric, and controlling, with the PCPV, the processing step during fabrication."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Process control of semiconductor fabrication based on spectra quality metrics","description":"A process control method for manufacturing semiconductor devices, including determining a quality metric of a production semiconductor wafer by comparing production scatterometric spectra of a product","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11300948","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11300948","citation_suggestion":"Patentable. \"Process control of semiconductor fabrication based on spectra quality metrics\" (US-11300948). https://patentable.app/patents/US-11300948","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11300948","json":"https://patentable.app/api/llm-context/US-11300948","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T22:39:32.404Z"}