{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11301983","patent":{"patent_number":"US-11301983","title":"Measuring height difference in patterns on semiconductor wafers","assignee":null,"inventors":[],"filing_date":"2020-08-17T00:00:00.000Z","publication_date":"2022-04-12T00:00:00.000Z","cpc_codes":["G06T","G06T","G06T"],"num_claims":20,"abstract":"An improved technique for determining height difference in patterns provided on semiconductor wafers uses real measurements (e.g., measurements from SEM images) and a height difference determination model. In one version of the model, a measurable variable of the model is expressed in terms of a function of a change in depth of shadow (i.e. relative brightness), wherein the depth of shadow depends on the height difference as well as width difference between two features on a semiconductor wafer. In another version of the model, the measurable variable is expressed in terms of a function of a change of a measured distance between two characteristic points on the real image of a periodic structure with respect to a change in a tilt angle of a scanning electron beam."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Measuring height difference in patterns on semiconductor wafers","description":"An improved technique for determining height difference in patterns provided on semiconductor wafers uses real measurements (e.g., measurements from SEM images) and a height difference determination m","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11301983","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11301983","citation_suggestion":"Patentable. \"Measuring height difference in patterns on semiconductor wafers\" (US-11301983). https://patentable.app/patents/US-11301983","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11301983","json":"https://patentable.app/api/llm-context/US-11301983","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T21:44:52.610Z"}