{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11305986","patent":{"patent_number":"US-11305986","title":"Method of manufacturing semiconductor device, substrate processing apparatus and program","assignee":null,"inventors":[],"filing_date":"2020-02-21T00:00:00.000Z","publication_date":"2022-04-19T00:00:00.000Z","cpc_codes":["G01N","H01L","H01L","H01L","H01L","H01L","H01L","H01L","A61B"],"num_claims":20,"abstract":"There is provided a technique for improving a resistance of a film to vibration in a semiconductor device having a vibrating film, including at least: forming a first silicon oxide film; forming a first silicon nitride film; forming a second silicon oxide film; and forming a second silicon nitride film, and each film formation is performed using a substrate processing apparatus configured to supply gas to a process chamber including upper and bottom electrodes, and selectively supply high frequency power or low frequency power to each of the upper and bottom electrodes by switching."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method of manufacturing semiconductor device, substrate processing apparatus and program","description":"There is provided a technique for improving a resistance of a film to vibration in a semiconductor device having a vibrating film, including at least: forming a first silicon oxide film; forming a fir","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11305986","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11305986","citation_suggestion":"Patentable. \"Method of manufacturing semiconductor device, substrate processing apparatus and program\" (US-11305986). https://patentable.app/patents/US-11305986","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11305986","json":"https://patentable.app/api/llm-context/US-11305986","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T11:19:48.147Z"}