{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11466234","patent":{"patent_number":"US-11466234","title":"Surface treatment composition, method for producing surface treatment composition, surface treatment method, and method for producing semiconductor substrate","assignee":null,"inventors":[],"filing_date":"2020-09-03T00:00:00.000Z","publication_date":"2022-10-11T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L"],"num_claims":16,"abstract":"To provide a means capable of sufficiently removing organic residues present on the surface of a polishing object after polishing containing silicon oxide or polysilicon.A surface treatment composition contains a polymer having a constituent unit represented by Formula (1) below and water and is used for treating the surface of a polishing object after polishing,     "},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Surface treatment composition, method for producing surface treatment composition, surface treatment method, and method for producing semiconductor substrate","description":"To provide a means capable of sufficiently removing organic residues present on the surface of a polishing object after polishing containing silicon oxide or polysilicon.A surface treatment compositio","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11466234","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11466234","citation_suggestion":"Patentable. \"Surface treatment composition, method for producing surface treatment composition, surface treatment method, and method for producing semiconductor substrate\" (US-11466234). https://patentable.app/patents/US-11466234","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11466234","json":"https://patentable.app/api/llm-context/US-11466234","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T03:22:55.759Z"}