{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11467484","patent":{"patent_number":"US-11467484","title":"Method for inspecting a reticle, a method for manufacturing a reticle, and a method for manufacturing a semiconductor device using the same","assignee":null,"inventors":[],"filing_date":"2020-02-25T00:00:00.000Z","publication_date":"2022-10-11T00:00:00.000Z","cpc_codes":["H01L","H01L","G01N"],"num_claims":9,"abstract":"A method for inspecting a reticle including a reflective layer on a reticle substrate is provided. The method may include loading the reticle on a stage, cooling the reticle substrate to a temperature lower than a room temperature, irradiating a laser beam to the reflective layer on the reticle substrate, receiving the laser beam using a photodetector to obtain an image of the reflective layer, and detect a particle defect on the reflective layer or a void defect in the reflective layer based on the image of the reflective layer."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method for inspecting a reticle, a method for manufacturing a reticle, and a method for manufacturing a semiconductor device using the same","description":"A method for inspecting a reticle including a reflective layer on a reticle substrate is provided. The method may include loading the reticle on a stage, cooling the reticle substrate to a temperature","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11467484","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11467484","citation_suggestion":"Patentable. \"Method for inspecting a reticle, a method for manufacturing a reticle, and a method for manufacturing a semiconductor device using the same\" (US-11467484). https://patentable.app/patents/US-11467484","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11467484","json":"https://patentable.app/api/llm-context/US-11467484","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T20:05:07.007Z"}