{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11472097","patent":{"patent_number":"US-11472097","title":"Imprint apparatus, imprint method, and article manufacturing method","assignee":null,"inventors":[],"filing_date":"2019-05-24T00:00:00.000Z","publication_date":"2022-10-18T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L"],"num_claims":10,"abstract":"An imprint apparatus includes a deforming mechanism for deforming a pattern region of a mold, and performs, after first processing for applying a first deformation amount, second processing for curing an imprint material in a state where the imprint material and the pattern region are in contact with each other and where a second deformation amount is given to the mold by the deforming mechanism to reduce an overlay error between each shot region and the pattern region. A magnitude relation between a driving force of the deforming mechanism required to set a deformation amount of the mold to the first deformation amount and a driving force of the deforming mechanism required to set the deformation amount of the mold to the second deformation amount varies depending on a magnitude of the driving force of the deforming mechanism for setting the deformation amount to the second deformation amount."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Imprint apparatus, imprint method, and article manufacturing method","description":"An imprint apparatus includes a deforming mechanism for deforming a pattern region of a mold, and performs, after first processing for applying a first deformation amount, second processing for curing","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11472097","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11472097","citation_suggestion":"Patentable. \"Imprint apparatus, imprint method, and article manufacturing method\" (US-11472097). https://patentable.app/patents/US-11472097","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11472097","json":"https://patentable.app/api/llm-context/US-11472097","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T18:25:28.087Z"}