{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11474434","patent":{"patent_number":"US-11474434","title":"Mask and method for manufacturing the same, lithography method, display panel, display device and exposure device","assignee":null,"inventors":[],"filing_date":"2020-03-20T00:00:00.000Z","publication_date":"2022-10-18T00:00:00.000Z","cpc_codes":["G02F","G02F","G02F","G02F","G02F","G02F","G02F"],"num_claims":15,"abstract":"A mask is provided in embodiments of the disclosure, at least including: a first light transmission area provided with a first optical filter film; and a second light transmission area provided with a second optical filter film; the first optical filter film and the second optical filter film comprise respective materials through which light of different frequency ranges is optically filtered, respectively. A method for manufacturing a mask, a lithography method, a display panel, a display device, and an exposure device are further provided in embodiments of the disclosure."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Mask and method for manufacturing the same, lithography method, display panel, display device and exposure device","description":"A mask is provided in embodiments of the disclosure, at least including: a first light transmission area provided with a first optical filter film; and a second light transmission area provided with a","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11474434","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11474434","citation_suggestion":"Patentable. \"Mask and method for manufacturing the same, lithography method, display panel, display device and exposure device\" (US-11474434). https://patentable.app/patents/US-11474434","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11474434","json":"https://patentable.app/api/llm-context/US-11474434","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T00:36:42.006Z"}